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Publications
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Various links on this page lead to documents that are available to subscribers only. In this case, an additional link has been added to the listing in order to provide access to the respective abstract. Abstracts are usually accessible to anyone. |
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Just click on any cover below to visit the homepage of the respective journal. All those links can be found in one place here ! |
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B. Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A.
Kloidt, H. Müller, K. Nolting und U. Heinzmann.
Multischichten für optische Komponenten im weichen Röntgengebiet VDI Verlag Dünnschichttechnologie '90 Bd. II (1990) 480-502. |
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A. Kloid, K. Nolting, U. Kleineberg, B. Schmiedeskamp,
U. Heinzmann, P. Müller und M. Kühne.
Enhancement of the Reflektivity of Mo/Si Multilayer X--Ray Mirrors by Thermal Treatment Applied Physics Letter 58(23) (1991) 2601-2603. |
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B. Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A.
Kloidt, K. Nolting, M. Pröpper, H.-J. Stock, T. Tappe und U.
Heinzmann.
Multischichten für optische Komponenten im weichen Röntgengebiet VDI Verlag Dünnschichttechnologie '92 (1992) 329-336. |
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S. Rahn, A. Kloidt, U. Kleineberg, B. Schmiedeskamp, K. Kadel,
W. K. Schomburg, J. Hormes, U. Heinzmann.
Large area soft X-ray projection lithography using multilayer mirrors structured by RIE Proceedings SPIE 1742 (1992) 585-592. |
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A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper,
K. Nolting, B. Heidemann, T. Tappe, B. Schmiedeskamp, U.
Heinzmann, M. Krumrey, P. Müller, F. Scholze, S. Rahn, J. Hormes,
K. F. Heidemann.
Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components Proceedings SPIE 1742 (1992) 593-603. |
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H.-J. Stock, U. Kleineberg, A. Kloidt, B. Schmiedeskamp, U.
Heinzmann, M. Krumrey, P. Müller, F. Scholze.
Mo0.5Si0.5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity Applied Physics Letters 63 (16) (1993) 2207-2209. |
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B. Heidemann, T. Tappe, B. Schmiedeskamp und U. Heinzmann.
High Resolution Rutherford Backscattering Spectroscopy Studies on Mo/Si Multilayers . Thin Solid Films 228 (1993) 60-63. |
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A. Kloid, H. -J. Stock, U. Kleineberg,
T. Döhring, M. Pröpper, B. Schmiedeskamp und
U. Heinzmann.
Smoothing of Interfaces in Ultrathin Mo/Si Multilayers by Ion Bombardment . Thin Solid Films 228 (1993) 154-157. |
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B. Schmiedeskamp, A. Kloid, H.-J. Stock, U. Kleineberg,
T. Döring, M. Pröpper, S. Rahn, K. Hilgers,
B. Heidemann,
T. Tappe, U. Heinzmann, M. Krumrey, P. Müller,
F. Scholze und K. F. Heidemann.
Electron--beam deposited Mo/Si and Mo x Si y / Si Multilayer Mirrors and Gratings . Optical Engineering 33 (1994) 1314-1321. |
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H.-J. Stock, U. Kleineberg, B. Heidemann, K. Hilgers, A. Kloidt, B.
Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze.
Thermal Stability of Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by Electron-Beam Evaporation Applied Physics A 58 (1994) 371-376. |
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U. Kleineberg, H.-J. Stock, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, S.
Hopfe, R. Scholz .
Interface Stability and Silicide Formation in High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and HRTEM Physica Status Solidi A 145 (1994) 539-550. |
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U. Kleineberg, H.-J. Stock, D. Menke, K. Osterried, B. Schmiedeskamp, U.
Heinzmann, D. Fuchs, P. Müller, F. Scholze,
K. F. Heidemann, B. Nelles, J. Thieme.
Multilayer Reflection Type Zone Plates and Blazed Gratings for the Normal Incidence Soft X-Ray Region Proceedings SPIE 2279 (1994) 269-282. |
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B. Schmiedeskamp, T. Tappe, B. Heidemann, J. Schlosser, G. Haindl, U.
Kleineberg, T. Albers, M. Neumann.
Characterization of GaAs/AlAs Interfaces with Silicon Interlayers World Scientific (1994). |
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U. Kleineberg, K. Osterried, H.-J. Stock, D. Menke, B. Schmiedeskamp,
D. Fuchs, P. Müller, F. Scholze, K. F.
Heidemann, B. Nelles, U. Heinzmann .
Mo/Si-multilayer-coated ruled blaze gratings for the soft x- ray region Applied Optics 34 (28) (1995) 6506-6512. |
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D. Menke, U. Kleineberg, U. Heinzmann, C. Ziethen,
O. Schmidt, G. Schönhense und F. Schäfers.
XPEEM Microspectroscopy . BESSY Jahresbericht (1996) 480-483. |
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U. Kleineberg, H.-J. Stock, A. Kloidt, K. Osterried, D.
Menke, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, P. Müller,
F. Scholze, G. Ulm, K. F. Heidemann, B. Nelles
Mo/Si Multilayer Coated Laminar Phase and Ruled Blaze Gratings for the Soft X-Ray Region J. Electr. Spectr. Rel. Phenom. 80 (1996) 389-392. |
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E. D`Anna, A. Luches, M. Martino, M. Brunel, E. Majkova, S.
Luby, R. Senderak, M. Jergel, F. Hamelmann, U. Kleineberg,
U. Heinzmann.
Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses Applied Surface Science 106 (1996) 166-170. |
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R. Senderak, M. Jergel, S. Luby, E. Majkova, V. Holy, G.
Haindl, F. Hamelmann, U. Kleineberg, U. Heinzmann.
Thermal stability of W1-xSix/Si multilayer under rapid thermal annealing Journal of Applied Physics 81 (5) (1997) 2229-2235. |
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H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke,
B. Schmiedeskamp, K. Osterried, K. F. Heidemann und
U. Heinzmann.
Carbon Buffer Layers for Smoothing Superpolished Glass Surfaces as Substrates for Molybdenum/Silicon Multilayer Soft-X- Ray Mirrors . Applied Optics 36(7) (1997) 1650-1654. |
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M.P. Kowalski, R.G. Cruddace, J.F. Seely, J.C. Rife, K.F. Heidemann,
U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, W.R. Hunter
Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5 - 16.0-nm wavelength region Optics Letters 22 (11) (1997) 834-836. |
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J.F. Seely, M.P. Kowalski, R.G. Cruddace, K.F. Heidemann, U. Heinzmann,
U. Kleineberg, K. Osterried, D. Menke, J.C. Rife, W.R. Hunter.
Multilayer-coated laminar grating with 16% normal-incidence efficiency in the 150 A wavelength region Applied Optics 36 (31) (1997) 8206-8213. |
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U. Kleineberg, H.-J. Stock, D. Menke, O. Wehmeyer,
U. Heinzmann, D. Fuchs, P. Bulicke, M. Wedowski, G. Ulm,
K.F. Heidemann, K. Osterried
Multilayer-coated soft x-ray diffraction gratings for synchrotron radiation applications Proceedings SPIE 3150 (1997) 18-30. |
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M. Drescher, G. Snell, U. Kleineberg, H.-J. Stock, N. Müller, U. Heinzmann,
N.B. Brooks.
Characterization of the helical undulator HELIOS I in the 520 to 930 eV range using a multilayer polarimeter Review of Scientific Instruments 68 (5) (1997) 1939-1944. |
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D. Schulze, M. Dorr, G. Sommerer, J. Ludwig, P.V. Nickles, T. Schlegel, W.
Sandner, M. Drescher, U. Kleineberg, U. Heinzmann.
Polarization of the 61st harmonic form 1053 nm laser radiation in neon Physical Review 57 (4) (1998) 3003-3007. |
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H.-J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg,
U. Heinzmann, P. Bulicke, D. Fuchs, G. Ulm.
Carbon/Titanium multilayer as soft x-ray mirrors for the water-window Applied Optics 37(25) (1998) 6002-6005. |
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M. Jergel, V. Holy, E. Majkova, S. Luby, R. Senderak, H.-J. Stock, D. Menke, U.
Kleineberg, U. Heinzmann.
X-ray scattering study of interface roughness correlation in Mo/Si and Ti/C multilayers for X-UV optics Physica B 253(1-2) (1998) 28-39. |
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O. Schmidt, Ch. Ziethen, G.H. Fecher, , M. Merkel, M. Escher, D. Menke, U.
Kleineberg, U. Heinzmann, G. Schönhense.
Chemical microanalysis by selected-area ESCA using an electron energy filter in a photoemission microscope J. Electr. Spectr. Rel. Phenom. 88-91 (1998) 1009-1014. |
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J. Hartwich, L. Dreeskornfeld, V. Heisig, S. Rahn, O. Wehmeyer, U. Kleineberg,
U. Heinzmann.
STM writing of artificial nanostructures in ultrathin PMMA and SAM resists and subsequent pattern transfer in a Mo/Si multilayer by Reactive Ion Etching Applied Physics A 66 (1998) 685-688. |
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F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld,
U. Kleineberg, P. Jutzi, U. Heinzmann.
W/Si multilayers deposited by hot-filament MOCVD Thin Solid Films 338(1-2) (1999) 70-74. |
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U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.H. Fecher,
G. Schönhense.
Photoemission Microscopy with Microspot-XPS by use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY J.Elect.Spect.Rel.Phen. 101-103 (1999) 931-936. |
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Zi-chun Le, L. Dreeskornfeld, S. Rahn, R. Segler, U. Kleineberg, U. Heinzmann.
Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer Chinese Physics Letters 16(9) (1999) 665-666. |
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T. Yamazaki, N. Miyata, Y. Harada, M. Yanagihara, E. Gullikson, S. Mrowka, U.
Kleineberg, J. Underwood, K. Sano, M. Ishino, M. Koike.
Comparison of mechanical ruled varied line spacing grating vs. laminar-type holographic grating for soft X-ray flat field spectrograph Applied Optics 38(19) (1999) 4001-4003. |
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S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova, U.
Kleineberg, U. Heinzmann.
Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing Applied Surface Science 150(1-4) (1999) 178-184. |
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M. Wedowski, S. Bajt, J. A. Folta, E.M. Gullikson, U. Kleineberg, L.E.
Klebanoff, M.E. Malinowski, W.M. Clift
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography Proceedings SPIE 3767 (1999) 217-224. |
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F. Hamelmann, G. Haindl, J. Hartwich, A. Klipp, E. Majkova, U. Kleineberg, P.
Jutzi, U, Heinzmann
Metal/Silicon Multilayers Produced by Low-Temperature MOCVD Properties and Processing of Vapor-Deposited Coatings (eds. M. Pickering, B.W. Sheldon, W.Y. Lee, R.N. Johnson), Mater. Res. Soc. Proc. 555 (1999) 19-24. |
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| Bibliographic Data |
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M. Sundermann, J. Hartwich, K. Rott, D. Meiners, E. Majkova, U. Kleineberg, M.
Grunze, U. Heinzmann
Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in Self-Assembled Monolayers Surf. Science 454-456 (2000) 1104-1109. |
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L. Dreeskornfeld, R. Segler, G. Haindl, O. Wehmeyer, S. Rahn, E. Majkova, U.
Kleineberg, U. Heinzmann, P. Hudek, I. Kostic
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy Microelectronic Engineering 54 (3-4) (2000) 303-314. |
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F. Hamelmann, A. Klipp, G. Haindl, J. Schmalhorst, E. Majkova, U. Kleineberg,
P. Jutzi, U. Heinzmann
Metaloxide/Siliconoxide Multilayers with Smooth Interfaces Produced by in-situ Controlled Plasma-Enhanced MOCVD Thin Solid Films 358(1-2) (2000) 90-93. |
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M. Jergel, V. Holy, E. Majkova, S. Luby, R. Senderak, H.J. Stock, D. Menke, U.
Kleineberg, U. Heinzmann
Effect of ion-beam polishing on the interface quality in a Ti/C multilayer mirror for "water window" Materials Science Forum 321-324 (2000) 184-190. |
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L. Dreeskornfeld, G. Haindl, U. Kleineberg, U. Heinzmann, F. Shi, B. Volland,
I.W. Rangelow, E. Majkova, S. Luby, I. Kostic, L. Matay, P. Hrkut, P. Hudek
Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask Journal of Vacuum Science and Technology B (submitted 9/2000). |
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Y.C. Lim, T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl, U.
Kleineberg, U. Heinzmann
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth Applied Physics A 72 (2001) 121-124. |
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| Bibliographic Data |
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A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper,
S. Rahn, K. Hilgers, B. Heidemann, T. Tappe, B. Schmiedeskamp,
U. Heinzmann.
Preparation and microstructure analysis of Mo/Si multilayers as x-ray optical components 3S'93 Symposium on Surface Science, Kaprun/Austria (1993) 115-120. |
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AD. Schulze, G. Sommerer, M. Drescher, J. Ludwig, U. Kleineberg,
P.V. Nickles, U. Heinzmann, W. Sandner.
Multilayer reflectors for polarization analysis of XUV radiation X-Ray Lasers 1996, Int. Phys. Conf. Ser. 151 (1996) Section 10. |
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A. Aschentrup, I. Kolina, Y. Chol Lim, G. Haindl, U. Kleineberg, U. Heinzman,
Majkova, A. Anopchenko, M. Jergel, S. Luby, V. Holy
Interface morphology of Mo/Si MLs prepared by various deposition techniques The 5th International Conference on the Physics of X-Ray Multilayer Structures, Chamonix 2000 |
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A. Aschentrup, O. Wehmeyer, F. Hamelmann, I. Kolina, G. Haindl, A. Klipp, T.
Westerwalbesloh, E. Majkova, U. Kleineberg, P. Jutzi U. Heinzmann
MOCVD in cross comparison with UHV e-beam evaporation as deposition techniques of EUV multilayers The 5th International Conference on the Physics of X-Ray Multilayer Structures, Chamonix 2000 |
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Y. C. Lim,T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl, U.
Kleineberg,T. Wiesenthal, P. Siffalovic, M. Spieweck, M. Drescher, U. Heinzmann
Fabrication and characterization of EUV multilayer mirrors with a small spectral reflection bandwidth The 5th International Conference on the Physics of X-Ray Multilayer Structures, Chamonix 2000 |
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S. Luby, E. Majkova. M. Jergel, F. Hamelmann, G. Haindl, U. Kleineberg, U.
Heinzmann
Interface roughness of the refractory metal based X-ray multilayers prepared by various deposition techniques The 5th International Conference on the Physics of X-Ray Multilayer Structures, Chamonix 2000 |
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O. Wehmeyer, T. Westerwalbesloh, U. Kleineberg und
U. Heinzmann.
Röntgenoptische Komponenten für EUVL, Nanotechnologie und Synchrotronstrahlungsforschung . Hannovermesse Industrie 2000 |
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The following links will lead you directly to the homepages of respective journals in which members of our research group have already published. Search for more articles on multi-layers and X-ray optics there or just check out the latest issues! Access to articles may be restricted, but abstracts are usually always available. |
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Adobe offers a free viewer for documents in the widespread PDF format, the Adobe Acrobat Reader . Ocasionally, articles are also offered in the MS Word-Format. There is also a free MS Word-Viewer offered by Microsoft. Just click here . |
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Back to the homepage of the multilayer working group
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Erstellt von
Kai Multhaup
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Letzte Änderung
26.09.2001 |
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©2001
Molekül- und Oberflächenphysik
Universität Bielefeld |
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